If you are looking for high-quality products, please feel free to contact us and send an inquiry, email: firstname.lastname@example.org
Zinc Nitride: Overview
The formula for zinc nitride Zn3N2, a gray crystal that is soluble with hydrochloric Acid. It decomposes quickly into zinc hydroxide, and ammonia when placed in cold water. It can be produced by reacting ammonia with zinc powder at 500-600degC.
The following are some examples of how to use
Zinc nitride film is prepared using this product
Zinc Nitride (Zn3N2) is a unique material with electrical and optical properties. The energy band gaps of zinc oxide, whether an indirect or direct band gap silicon, have always been a major controversy in semiconductors. The band gap can be greatly affected by industry problems, differences in growth conditions and preparation methods. As an example, prior art methods like magnetron deposition, chemical vapour deposition, electrostatic elctrostalysis, and molecular beam epitaxy are used to create zinc nitride layers.
Zinc oxide films made by the same technique have very different optical and electric properties. A simple, reproducible method that produces a high-quality crystalline film is urgently needed. A method is presented for the preparation of a zinc-nitride layer. The preparation method uses atomic layer deposition to prepare the Zinc Nitride film. This allows for precise control of the band gaps in the Zinc Nitride film. The prepared membrane is uniform, complete and has excellent performance.
The technical solutions that were adopted include:
Steps for the preparation of zinc nitride films include:
(1) Place the substrate inside the reaction chamber.
(2) Adsorb the zinc atoms from the zinc-containing pre-deposition source on the surface substrate by placing it in the reaction chamber of your atomic layer deposition machine.
(3) Allow the nitrogen-containing pre-cursor source to enter the reaction-chamber of the atomic-layer deposition equipment and then ionize this nitrogen-containing pre-cursor source using plasma. After ionization of the precursor source, the zinc-zinc covalent bonds are formed on the substrate surface by the nitrogen. Ionization of the nitrogen precursor. The source will be sent to a reaction equipment. In the cavity after ionization the nitrogen atoms of the nitrogen-containing precursor source are partially deposited. The zinc atom is bonded to the nitrogen atom by a covalent bond.
Repeat steps (2) and (3) for a layer-by-layer growth of the zinc nitride.
The method can produce high-quality crystalline materials and is repeatable. It is simple to implement and achieves crystals of excellent quality. The nitrogen is introduced to the atomic layer system via the plasma. After that, the conditions of the chamber are precisely set, including the vacuum level, the cycle period, the conditions for the plasma and the other conditions. Adjust the band-gap of the zinc nitride prepared film. According to the different electrical and optical requirements of application, the present invention is able to obtain various high quality zinc nitride movies with adjustable bands gaps.
2. Used to prepare touch screen covers and touch screen films
As technology advances and smart devices become more common, the demand for touch screens to be the main interface for human-computer interactions is increasing. In the prior art, the low coating yield and high production costs, as well as the low production efficiency, were problems when the light-shielding layers in the BM of the cover of the touchscreen was prepared by screen printing with black ink. When used with liquid crystal displays, it is easy to create bubbles. Also, the product cannot be fitted perfectly. Offer a zinc nitride-based touch screen and touchscreen cover film.
The new touch screen film is made of zinc nitride, which acts as the functional film of the black layer. This film has low surface reflection and low cost of production, and also high surface hardness. The new type is a touch-screen cover film that includes a Zn3N2 film and a Si3N4 film. The adhesion of a film decreases if its thickness exceeds 50 nm. However, if its thickness is below 10 nm it will transmit more light and will not be able to achieve the light-tightness effect. The zinc film is black, absorbs visible light well, and has a matte finish. It can be used to create a functional black layer. The touch-screen cover film embodiment comprises in order a zincnitride(Zn3N2)film, a silica nitride(Si3N4)film, and a protection film. This embodiment’s touch screen includes the glass substrate, the touch-screen cover film and a zinc nitride (Zn3N2) film.
(aka. Technology Co. Ltd., a global chemical material manufacturer and supplier with more than 12 years of experience in providing high-quality Nanomaterials and chemicals. Our company has developed several materials. Our zinc nitride is produced with high purity, small particles and low impurities. Please send us an e-mail or click the desired products to
Sending an inquiry