Metal Alloy High Purity Titanium Sputtering Target

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About Metal Alloy High Purity Titanium Sputtering Target:

Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering target is made of titanium metal, which is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.

Application:
mainly used for integrated circuit, DRAMS and flat panel display application.

Payment & Transportation:

Metal Alloy High Purity Titanium Sputtering Target Properties
Other Names	Titanium sputtering target
CAS No.	N/A
Compound Formula	Ti
Molecular Weight	N/A
Appearance	N/A
Melting Point	N/A
Solubility in water	N/A
Density	N/A
Purity	99.6%
Size	customized
Boling point	N/A
Specific Heat	N/A
Thermal Conductivity	N/A
Thermal Expansion	N/A
Young’s Modulus	N/A
Exact Mass	N/A
Monoisotopic Mass	N/A
Metal Alloy High Purity Titanium Sputtering Target Health & Safety Information
Safety Warning	N/A
Hazard Statements	N/A
Flashing point	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety Statements	N/A
RTECS Number	N/A
Transport Information	N/A
WGK Germany	N/A